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PDR0708Y
LUMINA HT POLISH PAD 3.25 IN (83 MM) 7LF QR II-C - 250/ROLL
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Description
Lumina Premium Polish Pad
- Exclusive fiber design ensures exceptional polishing results on all resin substrates
- High density fiber construction holds up for extended polishing cycles especially on Polycarbonate, Trivex and High Index
- Textile backing provides strength and durability with low polish carry out.
- High Tack adhesive system engineered for tools with base pads
- Larger 3 1/4" size ideal for today's lens sizes
- Standard polish time suggested at 5 to 6 minutes
- 16 to 18 psi for pin style polishers
- .25 to .30 bar for reception style polishers
- Slurry temperature of 55 - 60F for alloy blocking and 60 - 65F for wax blocking